Silicon nitride films are widely used in many fields, but there are few market participants in my country.

Silicon nitride film is an amorphous insulating material, which refers to a film made of silicon nitride compound as raw material. Silicon nitride films have the advantages of strong water vapor resistance, good chemical stability, good insulation properties, high dielectric constant, high density, high transparency, and high thermal conductivity. They are widely used in semiconductor manufacturing, electronic packaging, optoelectronic devices, thermal management systems, Photovoltaic power generation and other fields have broad application prospects.

Silicon nitride film preparation processes include direct nitridation, chemical vapor deposition (CVD) and physical vapor deposition (PVD). The direct nitridation method is a traditional preparation method for silicon nitride films. The production process of this method is relatively simple and the operating cost is low, but the impurity content of the finished product is high. The chemical vapor deposition method can be subdivided into PECVD method, LPCVD method and APCVD method. The full name of PECVD method is plasma enhanced chemical vapor deposition method. This method has the advantages of good finished product quality and simple equipment. The physical vapor deposition method is represented by magnetron reactive sputtering method, which is suitable for large-scale production of silicon nitride films.

According to the “2023-2028 China Silicon Nitride Thin Film Industry Market In-depth Research and Development Prospects Forecast Report released by the Industrial Research Center , Silicon nitride films are widely used in many fields, including semiconductor manufacturing, electronic packaging, optoelectronic devices, thermal management systems, etc. In the field of semiconductor manufacturing, silicon nitride films can be used as dielectric layer materials and barrier materials to prepare thin film transistors; in the field of electronic packaging, silicon nitride films can be used as packaging materials for electronic devices; in thermal management systems, silicon nitride Thin films can be used as heat dissipation materials; in the field of photovoltaic power generation, silicon nitride thin films can be used to manufacture crystalline silicon solar cells.

The electronic packaging field is the largest demand end for silicon nitride films. In recent years, thanks to national policy support and technological progress, my country’s wafer market prospects have continued to improve, and its production capacity has continued to expand. In 2022, my country’s 8-inch wafer production capacity will account for nearly 20% of the world’s total production capacity. Silicon nitride films can be used in wafer packaging. As the development of downstream industries accelerates, its market demand will become increasingly strong.

The main manufacturers of silicon nitride films in my country include Xiamen Super Core Technology Co., Ltd., Shaanxi Nonferrous Optoelectronics Technology Co., Ltd., etc. Compared with overseas developed countries, my country’s silicon nitride thin film industry started late, and there are fewer companies with production capabilities. In the future, as the industry’s prosperity improves, the number of companies deploying silicon nitride thin films in my country will further increase.

Industry analysts said that silicon nitride films are widely used in many fields and the industry has good development prospects. In recent years, thanks to the improvement of technological level, the development speed of my country’s silicon nitride thin film industry has accelerated, but there is still a gap in product quality compared with overseas developed countries. It is expected that in the future, as market demand becomes increasingly strong and local companies continue to exert their efforts, my country’s high-performance silicon nitride thin film market share will increase.