HDI Manufacturer | HDI Factory | High Quality HDI Products – chemhdi.com Market Arkema to create joint laboratory to develop sustainable photopolymers for coatings

Arkema to create joint laboratory to develop sustainable photopolymers for coatings

Arkema recently announced a partnership with the French National Center for Scientific Research (CNRS) and the University of Haute-Alsace to open a new laboratory at the Institute for Materials Science in Mulhouse.

Future-proof energy-saving technology

The lab will help accelerate research into photopolymerization, a future-proof technology that improves energy efficiency, eliminates the use of solvents, and explores new, more sustainable UV-curable materials.

“Arkema is pleased to launch this new joint laboratory together with CNRS and the University of Haut-Alsace to accelerate our fruitful collaboration. The development of photopolymerization technologies favors more efficient and sustainable processes, materials and solutions, This is in line with Arkema’s strategy,” said Arkema R&D Director Armand
Ajdari said.

“Our goal is to design more sustainable specialty photopolymer materials for applications such as adhesives, 3D printing, composites, electronics and coatings, with a focus on new energy, clean transportation, home efficiency and lightweight materials, among others. New market developments,” said Laurent Arkema, Vice President of Coating Additives
Peyronneau commented.

“This initiative will support us in delivering better sustainability across the value chain,” Peyronneau added.

Arkema through its flagship Sartomer®
The product line designs and markets specialty materials for photopolymerization and custom formulations for 3D printing through its N3xtDimension® product line. UV-curable specialty products are the leading solution and one of Arkema’s key low-VOC technologies, along with water-based, high-solids and powder.

This article is from the Internet, does not represent the position of Toluene diisocyanate reproduced please specify the source.https://www.chemhdi.com/archives/523

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