HDI Manufacturer | HDI Factory | High Quality HDI Products – chemhdi.com News Tetramethylammonium hydroxide (TMAH) has broad application prospects and the market size continues to expand

Tetramethylammonium hydroxide (TMAH) has broad application prospects and the market size continues to expand

Tetramethylammonium hydroxide (TMAH), also known as tetramethylammonium oxide and tetramethylamine hydroxide, has the chemical formula C4H13NO and is an organic compound. Tetramethylammonium hydroxide appears as a colorless crystalline powder, contains a certain ammonia smell, and is soluble in water and ethanol. Tetramethyl hydroxide has the characteristics of easy deliquescence, strong alkalinity, and no pollution to silicone products. It is widely used in catalysts, surfactants, organic synthesis reagents, cleaning agents, oxidants and other products.

The preparation methods of tetramethylammonium hydroxide include precipitation method, addition method, electrolysis method, ion exchange resin method, ion membrane electrolysis method, ion membrane method, etc. The ion membrane electrolysis method has the advantages of simple process flow, low energy consumption, safety and reliability, and low pollution. It is mainly used to prepare high-purity electronic grade tetramethylammonium hydroxide and can be subdivided into cation membrane electrolysis method and anion membrane electrolysis method. It is the mainstream preparation method of tetramethylammonium hydroxide. In recent years, benefiting from national policy support and the improvement of independent research and development capabilities of local enterprises, my country’s tetramethylammonium hydroxide industry has gradually developed in a green and environmentally friendly direction.

According to the “2023-2028 China Tetramethylammonium Hydroxide (TMAH) Industry Market In-depth Research and Development Prospects Forecast Report》 shows that tetramethylammonium hydroxide has excellent performance and has broad application prospects in many fields, including chemical industry, semiconductor, polarographic analysis, etc. In the chemical industry, tetramethylammonium hydroxide can be used as surfactants, catalysts, organic synthesis reagents, etc.; in the semiconductor field, tetramethylammonium hydroxide can be used as the main component of positive film developers, CMP cleaning fluids and other products. For photoresist stripping and removal of wafer surface impurities, etc.; in the field of polarographic analysis, tetramethylammonium hydroxide can be used as a methylation reagent.

In recent years, with the accelerated development of downstream industries, the market size of tetramethylammonium hydroxide has continued to expand. The global tetramethylammonium hydroxide market size will exceed RMB 8 billion in 2022. It is expected that in the future, as the application demand for high-purity electronic grade tetramethylammonium hydroxide increases, the global tetramethylammonium hydroxide market size will exceed 10 billion yuan by 2028.

The main players in the global tetramethylammonium hydroxide market include Japan’s Tokyo Onka Industry Co., Ltd., Japan’s Tokuyama Industrial Co., Ltd., etc. The main manufacturers of tetramethylammonium hydroxide in my country include Glinda, Runjing Technology, etc. Glinda is my country’s leading tetramethylammonium hydroxide company, and the company’s TMAH developer accounts for nearly 80% of its total business revenue.

Industry analysts said that tetramethylammonium hydroxide has broad application prospects in many fields. In the future, with the gradual release of downstream demand, the industry The speed of development will further accelerate. In recent years, my country’s research and development enthusiasm for tetramethylammonium hydroxide has been high. In the future, with the in-depth research and technological advancement of local enterprises, its application scope is expected to be further expanded.

This article is from the Internet, does not represent the position of Toluene diisocyanate reproduced please specify the source.https://www.chemhdi.com/archives/15772

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