The CMP polishing pad market is highly concentrated and industry development is difficult
Chemical mechanical polishing (CMP) is currently the only technology in the world that can take into account the global and local flatness of the surface, allowing chip manufacturers to continuously r…
Local companies break through key technologies, and the process of domestic substitution in the domestic CMP polishing slurry market accelerates
CMP polishing slurry, chemical mechanical polishing slurry, refers to a water-soluble polishing agent composed of solid particle abrasives, surfactants, stabilizers, oxidants and other ingredients. Ac…
CMP cleaning fluid is mainly used in the wafer manufacturing process. Overseas companies dominate the global market.
CMP technology, also known as chemical mechanical polishing technology, refers to the technology that uses chemical and mechanical methods to flatten wafers during the wafer manufacturing process. The…
The application demand for CMP polishing pads (CMP polishing pads) is increasing day by day. The process of localization in the Chinese market is accelerating.
CMP polishing pad, also known as CMP polishing pad and chemical mechanical planarization polishing pad, refers to a consumable that physically and mechanically polishes the wafer surface and removes i…
CMP polishing fluid has high industry barriers and local companies have greater room for development.
CMP polishing fluid is a kind of solution that produces a series of chemical reactions with the material surface to form a surface film, and then removes it through the abrasive particles in the ingre…
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