CMP cleaning fluid is mainly used in the wafer manufacturing process. Overseas companies dominate the global market.
CMP technology, also known as chemical mechanical polishing technology, refers to the technology that uses chemical and mechanical methods to flatten wafers during the wafer manufacturing process. The…
The trend of wafer thinning is rising, and the development of the temporary bonding adhesive (TBA) industry is ushering in a period of opportunity.
Temporary bonding adhesive, referred to as TBA, refers to an intermediate layer material used to bond functional wafers and temporary carrier boards. It generally has low cost, high adhesion, good the…